Tritek Circuit Products

 

Wet Process Controllers

TEKtroller CC-305  

Cupric Regeneration System

The TEKtrollerä CC-305 is a cupric chloride etch controller that controls copper content, acid normality and oxidation reduction potential. Cupric chloride etch solution is continuously monitored by ORP, Conductivity and Specific Gravity. Redox potential is measured by ORP and controlled by additions of our liquid chemical regenerant, CuOx-310 or CuOx-313.  Copper concentration is measure by specific gravity and controlled by additions of DI water.  Acid normality is measured by conductivity and controlled by additions of concentrated hydrochloric acid. 

TEKtroller pH- 100 D/S  Develop/Resist Strip

TEKtrollerä pH-100D: In Photoresist developing operations, photoresist loading and breakpoint are directly proportional to pH at a given line speed and working solution concentration.  The TEKtrollerä pH-100D provides steady state processing characteristics with constant line speed.  The TEKtrollerä pH-100D accurately controls the developer concentration with a chemical injector pump.

TEKtrollerä pH-100S:  The TEKtrollerä pH-100S is a resist stripper controller that controls resist loading, stripper solution concentration and pH.

 

TEKtroller AQ-80  Developer

(Single Channel)

The TEKtrollerä AQ-80 is an aqueous developer controller that controls resist loading, developer solution concentration and pH.  Since pH is directly related to resist loading at constant developer concentration, the TEKtrollerä maintains the developer concentration at a constant predetermined level.  The pH of the developer is monitored continuously and maintained at a constant predetermined level with additions of "virgin" working strength developer solution.  The working developer solution is prepared by the TEKtrollerä AQ-80 on a "real-time" basis from a liquid developer concentrate.

 

 

RS-450/MT  Developer  

(Dual Channel)

The TEKtrollerä RS-450 is an aqueous developer controller that controls resist loading, developer solution concentration and pH.  Since pH is directly related to resist loading at constant developer concentration, the TEKtrollerä maintains the developer concentration at a constant predetermined level.  The pH of the developer is monitored continuously and maintained at a constant predetermined level with additions of "virgin" working strength developer solution.  The working developer solution is prepared by the TEKtrollerä RS-450 on a "real-time" basis from a liquid developer concentrate.

 

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